Journal Article PUBDB-2025-01180

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Recent advances in atomic layer deposition of superconductingthin films: a review

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2025
RSC Publ. Cambridge

Materials Horizons 12(15), 5594 - 5626 () [10.1039/D5MH00323G]
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Abstract: The development of superconducting thin films has opened new avenues in electronic and quantumtechnologies, offering potential breakthroughs in performance due to their unique properties such aszero electrical DC resistance and perfect diamagnetism. Atomic Layer Deposition (ALD) has emergedas a promising technique for fabricating these films with high precision and uniformity. This reviewexplores the role of ALD in the production of superconducting thin films, detailing the fundamentalsof both superconductors and the ALD process, and discussing the various materials and techniquesused. It also examines the existing and potential applications of these films and considers futureprospects and challenges in the field.

Classification:

Contributing Institute(s):
  1. Supraleitende Beschleuniger Technologie (MSL)
Research Program(s):
  1. 621 - Accelerator Research and Development (POF4-621) (POF4-621)
  2. 05H21GURB2 - Verbundprojekt 05H2021 - R&D BESCHLEUNIGER (TOSCA): Neue Ansätze zur Messung und Modellierung der Oberflächeneigenschaften supraleitender Resonatoren (BMBF-05H21GURB2) (BMBF-05H21GURB2)
  3. 05K22GUD - Verbundprojekt 05K2022 - NOVALIS: Innovative Beschleunigertechnologien für effiziente Strahlungsquellen. Teilprojekt 1. (BMBF-05K22GUD) (BMBF-05K22GUD)
Experiment(s):
  1. No specific instrument

Appears in the scientific report 2025
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Medline ; Creative Commons Attribution CC BY 4.0 ; OpenAccess ; Clarivate Analytics Master Journal List ; Current Contents - Physical, Chemical and Earth Sciences ; Essential Science Indicators ; IF >= 10 ; JCR ; National-Konsortium ; SCOPUS ; Science Citation Index Expanded ; Web of Science Core Collection
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 Record created 2025-03-28, last modified 2025-08-28