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@ARTICLE{Deyu:625722,
author = {Deyu, Getnet Kacha and Wenskat, Marc and Gonzalez
Diaz-Palacio, Isabel and Blick, Robert and Zierold, Robert
and Hillert, Wolfgang},
title = {{R}ecent advances in atomic layer deposition of
superconductingthin films: a review},
journal = {Materials Horizons},
volume = {12},
number = {15},
issn = {2051-6347},
address = {Cambridge},
publisher = {RSC Publ.},
reportid = {PUBDB-2025-01180},
pages = {5594 - 5626},
year = {2025},
abstract = {The development of superconducting thin films has opened
new avenues in electronic and quantumtechnologies, offering
potential breakthroughs in performance due to their unique
properties such aszero electrical DC resistance and perfect
diamagnetism. Atomic Layer Deposition (ALD) has emergedas a
promising technique for fabricating these films with high
precision and uniformity. This reviewexplores the role of
ALD in the production of superconducting thin films,
detailing the fundamentalsof both superconductors and the
ALD process, and discussing the various materials and
techniquesused. It also examines the existing and potential
applications of these films and considers futureprospects
and challenges in the field.},
cin = {MSL},
ddc = {540},
cid = {I:(DE-H253)MSL-20170609},
pnm = {621 - Accelerator Research and Development (POF4-621) /
05H21GURB2 - Verbundprojekt 05H2021 - $R\&D$ BESCHLEUNIGER
(TOSCA): Neue Ansätze zur Messung und Modellierung der
Oberflächeneigenschaften supraleitender Resonatoren
(BMBF-05H21GURB2) / 05K22GUD - Verbundprojekt 05K2022 -
NOVALIS: Innovative Beschleunigertechnologien für
effiziente Strahlungsquellen. Teilprojekt 1.
(BMBF-05K22GUD)},
pid = {G:(DE-HGF)POF4-621 / G:(DE-Ds200)BMBF-05H21GURB2 /
G:(DE-Ds200)BMBF-05K22GUD},
experiment = {EXP:(DE-MLZ)NOSPEC-20140101},
typ = {PUB:(DE-HGF)16},
doi = {10.1039/D5MH00323G},
url = {https://bib-pubdb1.desy.de/record/625722},
}