TY  - JOUR
AU  - Deyu, Getnet Kacha
AU  - Wenskat, Marc
AU  - Gonzalez Diaz-Palacio, Isabel
AU  - Blick, Robert
AU  - Zierold, Robert
AU  - Hillert, Wolfgang
TI  - Recent advances in atomic layer deposition of superconductingthin films: a review
JO  - Materials Horizons
VL  - 12
IS  - 15
SN  - 2051-6347
CY  - Cambridge
PB  - RSC Publ.
M1  - PUBDB-2025-01180
SP  - 5594 - 5626
PY  - 2025
AB  - The development of superconducting thin films has opened new avenues in electronic and quantumtechnologies, offering potential breakthroughs in performance due to their unique properties such aszero electrical DC resistance and perfect diamagnetism. Atomic Layer Deposition (ALD) has emergedas a promising technique for fabricating these films with high precision and uniformity. This reviewexplores the role of ALD in the production of superconducting thin films, detailing the fundamentalsof both superconductors and the ALD process, and discussing the various materials and techniquesused. It also examines the existing and potential applications of these films and considers futureprospects and challenges in the field.
LB  - PUB:(DE-HGF)16
DO  - DOI:10.1039/D5MH00323G
UR  - https://bib-pubdb1.desy.de/record/625722
ER  -