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001     625722
005     20251014142010.0
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100 1 _ |a Deyu, Getnet Kacha
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245 _ _ |a Recent advances in atomic layer deposition of superconductingthin films: a review
260 _ _ |a Cambridge
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520 _ _ |a The development of superconducting thin films has opened new avenues in electronic and quantumtechnologies, offering potential breakthroughs in performance due to their unique properties such aszero electrical DC resistance and perfect diamagnetism. Atomic Layer Deposition (ALD) has emergedas a promising technique for fabricating these films with high precision and uniformity. This reviewexplores the role of ALD in the production of superconducting thin films, detailing the fundamentalsof both superconductors and the ALD process, and discussing the various materials and techniquesused. It also examines the existing and potential applications of these films and considers futureprospects and challenges in the field.
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700 1 _ |a Wenskat, Marc
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700 1 _ |a Gonzalez Diaz-Palacio, Isabel
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700 1 _ |a Blick, Robert
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700 1 _ |a Zierold, Robert
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700 1 _ |a Hillert, Wolfgang
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