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| Home > Publications database > On-chip aberration correction for planar nanofocusing x-ray lenses by focused ion-beam milling |
| Journal Article | PUBDB-2023-01445 |
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2023
American Inst. of Physics
Melville, NY
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Please use a persistent id in citations: doi:10.1063/5.0153149 doi:10.3204/PUBDB-2023-01445
Abstract: Aberration-free x-ray optics are a prerequisite for nondestructive scanning x-ray microscopy with highest spatial resolution in order to understand complex material systems and processes. Nevertheless, due to highly challenging manufacturing requirements, even state-of-the-art x-ray optics often still suffer from residual lens aberrations, and diffraction-limited performance can often only be achieved by inserting additional corrective optical elements. Here, the concept of tailor-made refractive x-ray phase plates is expanded by integrating these corrective optical elements into the focusing device directly. In this case, planar nanofocusing x-ray lenses out of silicon are corrected for aberrations by structuring the phase plate into the lens chip via focused ion-beam milling. The concept is demonstrated by focusing x-rays with an energy of 18 keV into a diffraction-limited focal spot with a size of $50 \times 65$ $nm^2$ full-width a half-maximum and a reduction in resudial intensity outside the focus by a factor of well over three.
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