TY  - JOUR
AU  - Seiboth, Frank
AU  - Schropp, Andreas
AU  - Lyubomirskiy, Mikhail
AU  - Wang, Wenxin
AU  - Jahn, Andreas
AU  - Kulkarni, Satishkumar
AU  - Keller, Thomas F.
AU  - Schroer, Christian
TI  - On-chip aberration correction for planar nanofocusing x-ray lenses by focused ion-beam milling
JO  - Applied physics letters
VL  - 122
IS  - 24
SN  - 0003-6951
CY  - Melville, NY
PB  - American Inst. of Physics
M1  - PUBDB-2023-01445
SP  - 241105
PY  - 2023
AB  - Aberration-free x-ray optics are a prerequisite for nondestructive scanning x-ray microscopy with highest spatial resolution in order to understand complex material systems and processes. Nevertheless, due to highly challenging manufacturing requirements, even state-of-the-art x-ray optics often still suffer from residual lens aberrations, and diffraction-limited performance can often only be achieved by inserting additional corrective optical elements. Here, the concept of tailor-made refractive x-ray phase plates is expanded by integrating these corrective optical elements into the focusing device directly. In this case, planar nanofocusing x-ray lenses out of silicon are corrected for aberrations by structuring the phase plate into the lens chip via focused ion-beam milling. The concept is demonstrated by focusing x-rays with an energy of 18 keV into a diffraction-limited focal spot with a size of 50 ×65 nm<sup>2</sup> full-width a half-maximum and a reduction in resudial intensity outside the focus by a factor of well over three.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:001009900600003
DO  - DOI:10.1063/5.0153149
UR  - https://bib-pubdb1.desy.de/record/580797
ER  -