%0 Journal Article
%A Seiboth, Frank
%A Schropp, Andreas
%A Lyubomirskiy, Mikhail
%A Wang, Wenxin
%A Jahn, Andreas
%A Kulkarni, Satishkumar
%A Keller, Thomas F.
%A Schroer, Christian
%T On-chip aberration correction for planar nanofocusing x-ray lenses by focused ion-beam milling
%J Applied physics letters
%V 122
%N 24
%@ 0003-6951
%C Melville, NY
%I American Inst. of Physics
%M PUBDB-2023-01445
%P 241105
%D 2023
%X Aberration-free x-ray optics are a prerequisite for nondestructive scanning x-ray microscopy with highest spatial resolution in order to understand complex material systems and processes. Nevertheless, due to highly challenging manufacturing requirements, even state-of-the-art x-ray optics often still suffer from residual lens aberrations, and diffraction-limited performance can often only be achieved by inserting additional corrective optical elements. Here, the concept of tailor-made refractive x-ray phase plates is expanded by integrating these corrective optical elements into the focusing device directly. In this case, planar nanofocusing x-ray lenses out of silicon are corrected for aberrations by structuring the phase plate into the lens chip via focused ion-beam milling. The concept is demonstrated by focusing x-rays with an energy of 18 keV into a diffraction-limited focal spot with a size of 50 ×65 nm<sup>2</sup> full-width a half-maximum and a reduction in resudial intensity outside the focus by a factor of well over three.
%F PUB:(DE-HGF)16
%9 Journal Article
%U <Go to ISI:>//WOS:001009900600003
%R 10.1063/5.0153149
%U https://bib-pubdb1.desy.de/record/580797