Home > Publications database > On-chip aberration correction for planar nanofocusing x-ray lenses by focused ion-beam milling > print

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100 1 _ |a Seiboth, Frank
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245 _ _ |a On-chip aberration correction for planar nanofocusing x-ray lenses by focused ion-beam milling
260 _ _ |a Melville, NY
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|b American Inst. of Physics
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520 _ _ |a Aberration-free x-ray optics are a prerequisite for nondestructive scanning x-ray microscopy with highest spatial resolution in order to understand complex material systems and processes. Nevertheless, due to highly challenging manufacturing requirements, even state-of-the-art x-ray optics often still suffer from residual lens aberrations, and diffraction-limited performance can often only be achieved by inserting additional corrective optical elements. Here, the concept of tailor-made refractive x-ray phase plates is expanded by integrating these corrective optical elements into the focusing device directly. In this case, planar nanofocusing x-ray lenses out of silicon are corrected for aberrations by structuring the phase plate into the lens chip via focused ion-beam milling. The concept is demonstrated by focusing x-rays with an energy of 18 keV into a diffraction-limited focal spot with a size of $50 \times 65$ $nm^2$ full-width a half-maximum and a reduction in resudial intensity outside the focus by a factor of well over three.
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700 1 _ |a Schropp, Andreas
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700 1 _ |a Lyubomirskiy, Mikhail
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700 1 _ |a Wang, Wenxin
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700 1 _ |a Jahn, Andreas
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700 1 _ |a Keller, Thomas F.
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700 1 _ |a Schroer, Christian
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773 _ _ |a 10.1063/5.0153149
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