Journal Article

PUBDB-2016-05566

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Improved tungsten nanofabrication for hard X-ray zone plates

Parfeniukas, K. (Corresponding author) ; Rahomäki, J. ; Giakoumidis, S.Extern* ; Seiboth, F.DESY* ; Wittwer, F.DESY* ; Schroer, C.DESY* ; Vogt, U.Extern*

2016
Elsevier [S.l.]

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Please use a persistent id in citations: doi:10.1016/j.mee.2015.12.015  doi:10.3204/PUBDB-2016-05566

Abstract: We present an improved nanofabrication method of high aspect ratio tungsten structures for use in high efficiency nanofocusing hard X-ray zone plates. A ZEP 7000 electron beam resist layer used for patterning is cured by a second, much larger electron dose after development. The curing step improves pattern transfer fidelity into a chromium hard mask by reactive ion etching using Cl2/O2 chemistry. The pattern can then be transferred into an underlying tungsten layer by another reactive ion etching step using SF6/O2. A 630 nm-thick tungsten zone plate with smallest line width of 30 nm was fabricated using this method and characterized. At 8.2 keV photon energy the device showed an efficiency of 2.2% with a focal spot size at the diffraction limit, measured at Diamond Light Source I-13-1 beamline.

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Contributing Institute(s):

1. FS-PETRA (FS-PETRA)

Research Program(s):

1. 6214 - Nanoscience and Materials for Information Technology (POF3-621) (POF3-621)

Experiment(s):

1. Measurement at external facility

Appears in the scientific report 2016

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Database coverage:
; ; ; Current Contents - Engineering, Computing and Technology ; Ebsco Academic Search ; IF < 5 ; JCR ; Nationallizenz ; SCOPUS ; Science Citation Index ; Science Citation Index Expanded ; Thomson Reuters Master Journal List ; Web of Science Core Collection

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