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| 001 | 315025 | ||
| 005 | 20250717105608.0 | ||
| 024 | 7 | _ | |a 10.1016/j.mee.2015.12.015 |2 doi |
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| 100 | 1 | _ | |a Parfeniukas, Karolis |b 0 |e Corresponding author |
| 245 | _ | _ | |a Improved tungsten nanofabrication for hard X-ray zone plates |
| 260 | _ | _ | |a [S.l.] |c 2016 |b Elsevier |
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| 520 | _ | _ | |a We present an improved nanofabrication method of high aspect ratio tungsten structures for use in high efficiency nanofocusing hard X-ray zone plates. A ZEP 7000 electron beam resist layer used for patterning is cured by a second, much larger electron dose after development. The curing step improves pattern transfer fidelity into a chromium hard mask by reactive ion etching using Cl2/O2 chemistry. The pattern can then be transferred into an underlying tungsten layer by another reactive ion etching step using SF6/O2. A 630 nm-thick tungsten zone plate with smallest line width of 30 nm was fabricated using this method and characterized. At 8.2 keV photon energy the device showed an efficiency of 2.2% with a focal spot size at the diffraction limit, measured at Diamond Light Source I-13-1 beamline. |
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| 773 | _ | _ | |a 10.1016/j.mee.2015.12.015 |g Vol. 152, p. 6 - 9 |0 PERI:(DE-600)1497065-x |p 6 - 9 |t Microelectronic engineering |v 152 |y 2016 |x 0167-9317 |
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