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@ARTICLE{Parfeniukas:315025,
author = {Parfeniukas, Karolis and Rahomäki, Jussi and Giakoumidis,
Stylianos and Seiboth, Frank and Wittwer, Felix and Schroer,
Christian and Vogt, Ulrich},
title = {{I}mproved tungsten nanofabrication for hard {X}-ray zone
plates},
journal = {Microelectronic engineering},
volume = {152},
issn = {0167-9317},
address = {[S.l.]},
publisher = {Elsevier},
reportid = {PUBDB-2016-05566},
pages = {6 - 9},
year = {2016},
abstract = {We present an improved nanofabrication method of high
aspect ratio tungsten structures for use in high efficiency
nanofocusing hard X-ray zone plates. A ZEP 7000 electron
beam resist layer used for patterning is cured by a second,
much larger electron dose after development. The curing step
improves pattern transfer fidelity into a chromium hard mask
by reactive ion etching using Cl2/O2 chemistry. The pattern
can then be transferred into an underlying tungsten layer by
another reactive ion etching step using SF6/O2. A 630
nm-thick tungsten zone plate with smallest line width of 30
nm was fabricated using this method and characterized. At
8.2 keV photon energy the device showed an efficiency of
$2.2\%$ with a focal spot size at the diffraction limit,
measured at Diamond Light Source I-13-1 beamline.},
cin = {FS-PETRA},
ddc = {620},
cid = {I:(DE-H253)FS-PETRA-20140814},
pnm = {6214 - Nanoscience and Materials for Information Technology
(POF3-621)},
pid = {G:(DE-HGF)POF3-6214},
experiment = {EXP:(DE-MLZ)External-20140101},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000385991400002},
doi = {10.1016/j.mee.2015.12.015},
url = {https://bib-pubdb1.desy.de/record/315025},
}