TY  - JOUR
AU  - Parfeniukas, Karolis
AU  - Rahomäki, Jussi
AU  - Giakoumidis, Stylianos
AU  - Seiboth, Frank
AU  - Wittwer, Felix
AU  - Schroer, Christian
AU  - Vogt, Ulrich
TI  - Improved tungsten nanofabrication for hard X-ray zone plates
JO  - Microelectronic engineering
VL  - 152
SN  - 0167-9317
CY  - [S.l.]
PB  - Elsevier
M1  - PUBDB-2016-05566
SP  - 6 - 9
PY  - 2016
AB  - We present an improved nanofabrication method of high aspect ratio tungsten structures for use in high efficiency nanofocusing hard X-ray zone plates. A ZEP 7000 electron beam resist layer used for patterning is cured by a second, much larger electron dose after development. The curing step improves pattern transfer fidelity into a chromium hard mask by reactive ion etching using Cl2/O2 chemistry. The pattern can then be transferred into an underlying tungsten layer by another reactive ion etching step using SF6/O2. A 630 nm-thick tungsten zone plate with smallest line width of 30 nm was fabricated using this method and characterized. At 8.2 keV photon energy the device showed an efficiency of 2.2
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000385991400002
DO  - DOI:10.1016/j.mee.2015.12.015
UR  - https://bib-pubdb1.desy.de/record/315025
ER  -