Journal Article

PUBDB-2024-05926

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Nucleation Behavior of SnS$_2$ on Thiol Functionalized SAMs During Solution‐Based Atomic Layer Deposition

Goetz, K. (Corresponding author)Extern* ; Prihoda, A.Extern* ; Shen, C.Extern*DESY* ; Dierner, M. ; Dallmann, J.Extern* ; Prusch, S. ; Zahn, D. ; Spiecker, E.Extern* ; Unruh, T. (Corresponding author)Extern*

2024
Wiley-VCH Weinheim

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Please use a persistent id in citations: doi:10.1002/admi.202300990  doi:10.3204/PUBDB-2024-05926

Abstract: Solution-based atomic layer deposition (sALD) is an emerging technique that transfers the principle of traditional atomic layer deposition (ALD) from the gas phase into a wet chemical environment. This new preparation technique has new and unique properties and requirements. A large number of new surfaces and reactants are available to produce active 2D materials.In this work a reproducible procedure to coat silicon wafers with a densely packed monolayer of (3-Mercaptopropyl)trimethoxysilane (MPTMS) molecules is presented. These highly functionalized surfaces can be used to seed the nucleation of SnS$_2$ in a solution-based ALD procedure. A coating routine for the production of SnS$_2$ is adapted from ALD to sALD and insight into the nucleation behavior of the reactands is given. X-ray reflectometry (XRR) is used to resolve the nucleation process of SnS$_2$ on an MPTMS self assembled monolayer (SAM) during the first three cycles of an sALD procedure. The comparison of ex situ XRR, in situ XRR, grazing incidence wide-angle X-ray scattering (GIWAXS), atomic force microscopy (AFM), energy dispersive X-ray spectroscopy (EDX) measurements, and density functional theory (DFT) calculations find that SnS$_2$ first forms a closed layer and then continues to grow in islands on thiol functionalized silane SAMs. Subsequent coating cycles will continue the growth of the islands laterally and in height.

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Contributing Institute(s):

1. PETRA-D (FS-PETRA-D)
2. DOOR-User (DOOR ; HAS-User)

Research Program(s):

1. 632 - Materials – Quantum, Complex and Functional Materials (POF4-632) (POF4-632)
2. 6G3 - PETRA III (DESY) (POF4-6G3) (POF4-6G3)
3. FS-Proposal: I-20180247 (I-20180247) (I-20180247)
4. DFG project G:(GEPRIS)214951840 - FOR 1878: funCOS - Funktionale molekulare Strukturen auf komplexen Oxidoberflächen (214951840) (214951840)

Experiment(s):

1. PETRA Beamline P08 (PETRA III)

Appears in the scientific report 2024

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