TY  - JOUR
AU  - Goetz, Klaus
AU  - Prihoda, Annemarie
AU  - Shen, Chen
AU  - Dierner, Martin
AU  - Dallmann, Johannes
AU  - Prusch, Saskia
AU  - Zahn, Dirk
AU  - Spiecker, Erdmann
AU  - Unruh, Tobias
TI  - Nucleation Behavior of SnS<sub>2</sub> on Thiol Functionalized SAMs During Solution‐Based Atomic Layer Deposition
JO  - Advanced materials interfaces
VL  - 11
SN  - 2196-7350
CY  - Weinheim
PB  - Wiley-VCH
M1  - PUBDB-2024-05926
SP  - 2300990
PY  - 2024
AB  - Solution-based atomic layer deposition (sALD) is an emerging technique that transfers the principle of traditional atomic layer deposition (ALD) from the gas phase into a wet chemical environment. This new preparation technique has new and unique properties and requirements. A large number of new surfaces and reactants are available to produce active 2D materials.In this work a reproducible procedure to coat silicon wafers with a densely packed monolayer of (3-Mercaptopropyl)trimethoxysilane (MPTMS) molecules is presented. These highly functionalized surfaces can be used to seed the nucleation of SnS<sub>2</sub> in a solution-based ALD procedure. A coating routine for the production of SnS<sub>2</sub> is adapted from ALD to sALD and insight into the nucleation behavior of the reactands is given. X-ray reflectometry (XRR) is used to resolve the nucleation process of SnS<sub>2</sub> on an MPTMS self assembled monolayer (SAM) during the first three cycles of an sALD procedure. The comparison of ex situ XRR, in situ XRR, grazing incidence wide-angle X-ray scattering (GIWAXS), atomic force microscopy (AFM), energy dispersive X-ray spectroscopy (EDX) measurements, and density functional theory (DFT) calculations find that SnS<sub>2</sub> first forms a closed layer and then continues to grow in islands on thiol functionalized silane SAMs. Subsequent coating cycles will continue the growth of the islands laterally and in height.   
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:001281612600001
DO  - DOI:10.1002/admi.202300990
UR  - https://bib-pubdb1.desy.de/record/614697
ER  -