Journal Article PUBDB-2016-03808

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Plasma Enhanced Complete Oxidation of Ultrathin Epitaxial Praseodymia Films on Si(111)

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2015
MDPI Basel

Materials 8(9), 6379 - 6390 () [10.3390/ma8095312]
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Abstract: Praseodymia films have been exposed to oxygen plasma at room temperature after deposition on Si(111) via molecular beam epitaxy. Different parameters as film thickness, exposure time and flux during plasma treatment have been varied to study their influence on the oxygen plasma oxidation process. The surface near regions have been investigated by means of X-ray photoelectron spectroscopy showing that the plasma treatment transforms the stoichiometry of the films from Pr2O3 to PrO2. Closer inspection of the bulk properties of the films by means of synchrotron radiation based X-ray reflectometry and diffraction confirms this transformation if the films are thicker than some critical thickness of 6 nm. The layer distance of these films is extremely small verifying the completeness of the plasma oxidation process. Thinner films, however, cannot be transformed completely. For all films, less oxidized very thin interlayers are detected by these experimental techniques.

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Contributing Institute(s):
  1. DOOR-User (DOOR)
Research Program(s):
  1. 6G3 - PETRA III (POF3-622) (POF3-622)
Experiment(s):
  1. DORIS Beamline W1 (DORIS III)
  2. PETRA Beamline P08 (PETRA III)

Appears in the scientific report 2015
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Medline ; Creative Commons Attribution CC BY 4.0 ; DOAJ ; OpenAccess ; Current Contents - Engineering, Computing and Technology ; DOAJ Seal ; Ebsco Academic Search ; IF < 5 ; JCR ; SCOPUS ; Science Citation Index Expanded ; Thomson Reuters Master Journal List ; Web of Science Core Collection
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 Record created 2016-09-24, last modified 2021-11-10


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