TY  - JOUR
AU  - Kuschel, Olga
AU  - Dieck, Florian
AU  - Wilkens, Henrik
AU  - Gevers, Sebastian
AU  - Rodewald, Jari
AU  - Otte, Christian
AU  - Zoellner, Marvin
AU  - Niu, Gang
AU  - Schroeder, Thomas
AU  - Wollschlaeger, Joachim
TI  - Plasma Enhanced Complete Oxidation of Ultrathin Epitaxial Praseodymia Films on Si(111)
JO  - Materials
VL  - 8
IS  - 9
SN  - 1996-1944
CY  - Basel
PB  - MDPI
M1  - PUBDB-2016-03808
SP  - 6379 - 6390
PY  - 2015
AB  - Praseodymia films have been exposed to oxygen plasma at room temperature after deposition on Si(111) via molecular beam epitaxy. Different parameters as film thickness, exposure time and flux during plasma treatment have been varied to study their influence on the oxygen plasma oxidation process. The surface near regions have been investigated by means of X-ray photoelectron spectroscopy showing that the plasma treatment transforms the stoichiometry of the films from Pr2O3 to PrO2. Closer inspection of the bulk properties of the films by means of synchrotron radiation based X-ray reflectometry and diffraction confirms this transformation if the films are thicker than some critical thickness of 6 nm. The layer distance of these films is extremely small verifying the completeness of the plasma oxidation process. Thinner films, however, cannot be transformed completely. For all films, less oxidized very thin interlayers are detected by these experimental techniques.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000362640300006
C6  - pmid:28793569
DO  - DOI:10.3390/ma8095312
UR  - https://bib-pubdb1.desy.de/record/309422
ER  -