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| Home > Publications database > Analysis of stress gradients in physical vapour deposition multilayers by X-ray diffraction at fixed depth intervals |
| Journal Article | PUBDB-2014-03878 |
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2014
Munksgaard
Copenhagen
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Please use a persistent id in citations: doi:10.1107/S1600576713030951
Abstract: The objective of this article is to develop and apply a model for the design and evaluation of X-ray diffraction experiments to measure phase-specific residual stress profiles in multilayer systems. Using synchrotron radiation and angle-dispersive diffraction, the stress measurements are performed on the basis of the sin2[psi] method. Instead of the traditional [Omega] or [chi] mode, the experiments are carried out by a simultaneous variation of the goniometer angles [chi], [Omega] and [varphi]G to ensure that the penetration and information depth and the measuring direction [varphi] remain unchanged when the polar angle [psi] is varied. The applicability of this measuring and evaluation strategy is demonstrated by the example of a multilayer system consisting of Ti and TiAlN layers, alternately deposited on a steel substrate by means of physical vapour deposition.
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