%0 Journal Article
%A Fischer, G.
%A Selvadurai, U.
%A Nellesen, J.
%A Sprute, T.
%A Tillmann, W.
%T Analysis of stress gradients in physical vapour deposition multilayers by X-ray diffraction at fixed depth intervals
%J Journal of applied crystallography
%V 47
%N 1
%@ 1600-5767
%C Copenhagen
%I Munksgaard
%M PUBDB-2014-03878
%P 335 - 345
%D 2014
%X The objective of this article is to develop and apply a model for the design and evaluation of X-ray diffraction experiments to measure phase-specific residual stress profiles in multilayer systems. Using synchrotron radiation and angle-dispersive diffraction, the stress measurements are performed on the basis of the sin2[psi] method. Instead of the traditional [Omega] or [chi] mode, the experiments are carried out by a simultaneous variation of the goniometer angles [chi], [Omega] and [varphi]G to ensure that the penetration and information depth and the measuring direction [varphi] remain unchanged when the polar angle [psi] is varied. The applicability of this measuring and evaluation strategy is demonstrated by the example of a multilayer system consisting of Ti and TiAlN layers, alternately deposited on a steel substrate by means of physical vapour deposition.
%F PUB:(DE-HGF)16
%9 Journal Article
%U <Go to ISI:>//WOS:000330485100042
%R 10.1107/S1600576713030951
%U https://bib-pubdb1.desy.de/record/187343