TY  - JOUR
AU  - Fischer, G.
AU  - Selvadurai, U.
AU  - Nellesen, J.
AU  - Sprute, T.
AU  - Tillmann, W.
TI  - Analysis of stress gradients in physical vapour deposition multilayers by X-ray diffraction at fixed depth intervals
JO  - Journal of applied crystallography
VL  - 47
IS  - 1
SN  - 1600-5767
CY  - Copenhagen
PB  - Munksgaard
M1  - PUBDB-2014-03878
SP  - 335 - 345
PY  - 2014
AB  - The objective of this article is to develop and apply a model for the design and evaluation of X-ray diffraction experiments to measure phase-specific residual stress profiles in multilayer systems. Using synchrotron radiation and angle-dispersive diffraction, the stress measurements are performed on the basis of the sin2[psi] method. Instead of the traditional [Omega] or [chi] mode, the experiments are carried out by a simultaneous variation of the goniometer angles [chi], [Omega] and [varphi]G to ensure that the penetration and information depth and the measuring direction [varphi] remain unchanged when the polar angle [psi] is varied. The applicability of this measuring and evaluation strategy is demonstrated by the example of a multilayer system consisting of Ti and TiAlN layers, alternately deposited on a steel substrate by means of physical vapour deposition.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000330485100042
DO  - DOI:10.1107/S1600576713030951
UR  - https://bib-pubdb1.desy.de/record/187343
ER  -