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000187343 1001_ $$0P:(DE-H253)PIP1005474$$aFischer, G.$$b0$$eCorresponding Author$$udesy
000187343 245__ $$aAnalysis of stress gradients in physical vapour deposition multilayers by X-ray diffraction at fixed depth intervals
000187343 260__ $$aCopenhagen$$bMunksgaard$$c2014
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000187343 520__ $$aThe objective of this article is to develop and apply a model for the design and evaluation of X-ray diffraction experiments to measure phase-specific residual stress profiles in multilayer systems. Using synchrotron radiation and angle-dispersive diffraction, the stress measurements are performed on the basis of the sin2[psi] method. Instead of the traditional [Omega] or [chi] mode, the experiments are carried out by a simultaneous variation of the goniometer angles [chi], [Omega] and [varphi]G to ensure that the penetration and information depth and the measuring direction [varphi] remain unchanged when the polar angle [psi] is varied. The applicability of this measuring and evaluation strategy is demonstrated by the example of a multilayer system consisting of Ti and TiAlN layers, alternately deposited on a steel substrate by means of physical vapour deposition.
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000187343 7001_ $$0P:(DE-H253)PIP1008119$$aSelvadurai, U.$$b1
000187343 7001_ $$0P:(DE-H253)PIP1010630$$aNellesen, J.$$b2
000187343 7001_ $$0P:(DE-H253)PIP1015191$$aSprute, T.$$b3
000187343 7001_ $$0P:(DE-H253)PIP1013991$$aTillmann, W.$$b4
000187343 773__ $$0PERI:(DE-600)2020879-0$$a10.1107/S1600576713030951$$gVol. 47, no. 1, p. 335 - 345$$n1$$p335 - 345$$tJournal of applied crystallography$$v47$$x1600-5767$$y2014
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000187343 9141_ $$y2014
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