Home > Publications database > In situ focus characterization by ablation technique to enable optics alignment at an XUV FEL source |
Journal Article | DESY-2013-00138 |
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2013
American Institute of Physics
[S.l.]
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Please use a persistent id in citations: doi:10.1063/1.4807896 doi:10.3204/DESY-2013-00138
Abstract: In situ focus characterization is demonstrated by working at an extreme ultraviolet (XUV) freeelectronlaser source using ablation technique. Design of the instrument reported here allows reachinga few micrometres resolution along with keeping the ultrahigh vacuum conditions and ensureshigh-contrast visibility of ablative imprints on optically transparent samples, e.g., PMMA. This enableson-line monitoring of the beam profile changes and thus makes possible in situ alignment ofthe XUV focusing optics. A good agreement between focal characterizations retrieved from in situinspection of ablative imprints contours and from well-established accurate ex situ analysis with Nomarskimicroscope has been observed for a typical micro-focus experiment.
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