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@ARTICLE{Gerasimova:152237,
author = {Gerasimova, Natalia and Dziarzhytski, Siarhei and Weigelt,
H. and Chalupský, J. and Hájková, V. and Vyšín, L. and
Juha, L.},
title = {{I}n situ focus characterization by ablation technique to
enable optics alignment at an {XUV} {FEL} source},
journal = {Review of scientific instruments},
volume = {84},
number = {6},
issn = {0034-6748},
address = {[S.l.]},
publisher = {American Institute of Physics},
reportid = {DESY-2013-00138},
pages = {065104 -},
year = {2013},
note = {© AIP Publishing LLC},
abstract = {In situ focus characterization is demonstrated by working
at an extreme ultraviolet (XUV) freeelectronlaser source
using ablation technique. Design of the instrument reported
here allows reachinga few micrometres resolution along with
keeping the ultrahigh vacuum conditions and
ensureshigh-contrast visibility of ablative imprints on
optically transparent samples, e.g., PMMA. This
enableson-line monitoring of the beam profile changes and
thus makes possible in situ alignment ofthe XUV focusing
optics. A good agreement between focal characterizations
retrieved from in situinspection of ablative imprints
contours and from well-established accurate ex situ analysis
with Nomarskimicroscope has been observed for a typical
micro-focus experiment.},
cin = {FS-FL},
ddc = {530},
cid = {I:(DE-H253)FS-FL-20120731},
pnm = {FLASH Beamline PG2 (POF2-54G16)},
pid = {G:(DE-H253)POF2-PG2-20130405},
experiment = {EXP:(DE-H253)F-PG2-20150101},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000321273500050},
pubmed = {pmid:23822375},
doi = {10.1063/1.4807896},
url = {https://bib-pubdb1.desy.de/record/152237},
}