TY  - JOUR
AU  - Gerasimova, Natalia
AU  - Dziarzhytski, Siarhei
AU  - Weigelt, H.
AU  - Chalupský, J.
AU  - Hájková, V.
AU  - Vyšín, L.
AU  - Juha, L.
TI  - In situ focus characterization by ablation technique to enable optics alignment at an XUV FEL source
JO  - Review of scientific instruments
VL  - 84
IS  - 6
SN  - 0034-6748
CY  - [S.l.]
PB  - American Institute of Physics
M1  - DESY-2013-00138
SP  - 065104 -
PY  - 2013
N1  - © AIP Publishing LLC
AB  - In situ focus characterization is demonstrated by working at an extreme ultraviolet (XUV) freeelectronlaser source using ablation technique. Design of the instrument reported here allows reachinga few micrometres resolution along with keeping the ultrahigh vacuum conditions and ensureshigh-contrast visibility of ablative imprints on optically transparent samples, e.g., PMMA. This enableson-line monitoring of the beam profile changes and thus makes possible in situ alignment ofthe XUV focusing optics. A good agreement between focal characterizations retrieved from in situinspection of ablative imprints contours and from well-established accurate ex situ analysis with Nomarskimicroscope has been observed for a typical micro-focus experiment.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000321273500050
C6  - pmid:23822375
DO  - DOI:10.1063/1.4807896
UR  - https://bib-pubdb1.desy.de/record/152237
ER  -