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000152237 1001_ $$0P:(DE-H253)PIP1005688$$aGerasimova, Natalia$$b0$$eCorresponding author
000152237 245__ $$aIn situ focus characterization by ablation technique to enable optics alignment at an XUV FEL source
000152237 260__ $$a[S.l.]$$bAmerican Institute of Physics$$c2013
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000152237 520__ $$aIn situ focus characterization is demonstrated by working at an extreme ultraviolet (XUV) freeelectronlaser source using ablation technique. Design of the instrument reported here allows reachinga few micrometres resolution along with keeping the ultrahigh vacuum conditions and ensureshigh-contrast visibility of ablative imprints on optically transparent samples, e.g., PMMA. This enableson-line monitoring of the beam profile changes and thus makes possible in situ alignment ofthe XUV focusing optics. A good agreement between focal characterizations retrieved from in situinspection of ablative imprints contours and from well-established accurate ex situ analysis with Nomarskimicroscope has been observed for a typical micro-focus experiment.
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000152237 7001_ $$0P:(DE-H253)PIP1008936$$aDziarzhytski, Siarhei$$b1
000152237 7001_ $$0P:(DE-H253)PIP1005804$$aWeigelt, H.$$b2
000152237 7001_ $$0P:(DE-HGF)0$$aChalupský, J.$$b3
000152237 7001_ $$0P:(DE-HGF)0$$aHájková, V.$$b4
000152237 7001_ $$0P:(DE-HGF)0$$aVyšín, L.$$b5
000152237 7001_ $$0P:(DE-HGF)0$$aJuha, L.$$b6
000152237 773__ $$0PERI:(DE-600)1472905-2$$a10.1063/1.4807896$$gVol. 84, no. 6, p. 065104 -$$n6$$p065104 -$$tReview of scientific instruments$$v84$$x0034-6748$$y2013
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