Home > Publications database > Topographic and Reflectometric Investigation of Crystallographic Defects and Surface Roughness in 4H Silicon Carbide Homoepitaxial Layers Deposited at Various Growth Rates |
Journal Article | PHPPUBDB-23963 |
; ; ; ; ; ; ;
2012
Acad. Inst.
Warsaw
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Please use a persistent id in citations: doi:10.12693/APhysPolA.121.915
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