| Home > Publications database > Influence of an Al$_2$O$_3$ Capping Layer on the Thermal Reduction of the NativeNiobium Oxide: An In situ X-ray Reflectivity Study |
| Journal Article | PUBDB-2025-02182 |
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2025
APS
College Park, MD
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Please use a persistent id in citations: doi:10.1103/48mp-wypj doi:10.3204/PUBDB-2025-02182
Abstract: Superconducting radio-frequency cavities, critical components of modern particle accelerators andquantum computing hardware, rely fundamentally on the surface properties of niobium. However,native oxide formation and impurity uptake in the near-surface region can degrade superconductingperformance and increase RF losses during operation. In this study, we present a systematic in situX-ray reflectivity investigation of (110) niobium single crystal surfaces with and without an atomiclayer deposited Al$_2$O$_3$ capping layer under ultra-high vacuum conditions up to 650 °C. Our resultsreveal a temperature-dependent reduction of the native niobium oxide layers in both capped anduncapped samples, with similarities in the overall behavior but clear differences in the reductionpathways. The Al$_2$O$_3$ capping layer modifies the reduction process, prevents oxide regrowth uponair exposure, and protects the niobium surface against impurity uptake during thermal treatment.These findings demonstrate that Al$_2$O$_3$ capping is an effective strategy to suppress native oxideformation during thermal cycling, offering clear benefits for the performance and operational lifetimeof superconducting radio-frequency cavities and related quantum computing technologies.
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