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000632415 1001_ $$0P:(DE-H253)PIP1101068$$aZaidman, Artem$$b0$$eCorresponding author
000632415 245__ $$aInfluence of an Al$_2$O$_3$ Capping Layer on the Thermal Reduction of the NativeNiobium Oxide: An In situ X-ray Reflectivity Study
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000632415 520__ $$aSuperconducting radio-frequency cavities, critical components of modern particle accelerators andquantum computing hardware, rely fundamentally on the surface properties of niobium. However,native oxide formation and impurity uptake in the near-surface region can degrade superconductingperformance and increase RF losses during operation. In this study, we present a systematic in situX-ray reflectivity investigation of (110) niobium single crystal surfaces with and without an atomiclayer deposited Al$_2$O$_3$ capping layer under ultra-high vacuum conditions up to 650 °C. Our resultsreveal a temperature-dependent reduction of the native niobium oxide layers in both capped anduncapped samples, with similarities in the overall behavior but clear differences in the reductionpathways. The Al$_2$O$_3$ capping layer modifies the reduction process, prevents oxide regrowth uponair exposure, and protects the niobium surface against impurity uptake during thermal treatment.These findings demonstrate that Al$_2$O$_3$ capping is an effective strategy to suppress native oxideformation during thermal cycling, offering clear benefits for the performance and operational lifetimeof superconducting radio-frequency cavities and related quantum computing technologies.
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000632415 7001_ $$0P:(DE-H253)PIP1013931$$aVonk, Vedran$$b1
000632415 7001_ $$0P:(DE-H253)PIP1093737$$aDeyu, Getnet Kacha$$b2
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000632415 773__ $$0PERI:(DE-600)2898355-5$$a10.1103/48mp-wypj$$gVol. 9, no. 9, p. 094806$$n9$$p094806$$tPhysical review materials$$v9$$x2475-9953$$y2025
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