Journal Article PUBDB-2019-03805

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An integrated cleanroom process for the vapor-phase deposition of large-area zeolitic imidazolate framework thin films

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2019
American Chemical Society Washington, DC

Chemistry of materials 31(22), 9462 - 9471 () [10.1021/acs.chemmater.9b03435]
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Abstract: Robust and scalable thin film deposition methods are key to realize the potential of metal-organic frameworks (MOFs) in electronic devices. Here, we report the first integration of the chemical vapor deposition (CVD) of MOF coatings in a custom reactor within a cleanroom setting. As a test case, the MOF-CVD conditions for ZIF-8 are optimized to enable smooth, pinhole-free, and uniform thin films on full 200 mm wafers under mild conditions. The single-chamber MOF-CVD process and the impact of the deposition parameters are elucidated via a combination of in situ monitoring and ex situ characterization. The resulting process guidelines will pave the way for new MOF-CVD formulations and a plethora of MOF-based devices.

Classification:

Note: © American Chemical Society

Contributing Institute(s):
  1. PETRA III (PETRA III)
Research Program(s):
  1. 6G3 - PETRA III (POF3-622) (POF3-622)
  2. FS-Proposal: I-20180033 EC (I-20180033-EC) (I-20180033-EC)
  3. FS-Proposal: I-20190028 (I-20190028) (I-20190028)
  4. CALIPSOplus - Convenient Access to Light Sources Open to Innovation, Science and to the World (730872) (730872)
Experiment(s):
  1. PETRA Beamline P02.1 (PETRA III)

Appears in the scientific report 2019
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Medline ; Embargoed OpenAccess ; Clarivate Analytics Master Journal List ; Current Contents - Engineering, Computing and Technology ; Current Contents - Physical, Chemical and Earth Sciences ; Ebsco Academic Search ; IF >= 5 ; JCR ; NationallizenzNationallizenz ; SCOPUS ; Science Citation Index ; Science Citation Index Expanded ; Web of Science Core Collection
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 Record created 2019-10-29, last modified 2025-07-29


Published on 2019-10-25. Available in OpenAccess from 2020-10-25.:
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