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| 001 | 426613 | ||
| 005 | 20250729163015.0 | ||
| 024 | 7 | _ | |a 10.1021/acs.chemmater.9b03435 |2 doi |
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| 100 | 1 | _ | |a Cruz, Alexander John |0 P:(DE-H253)PIP1086231 |b 0 |e First author |
| 245 | _ | _ | |a An integrated cleanroom process for the vapor-phase deposition of large-area zeolitic imidazolate framework thin films |
| 260 | _ | _ | |a Washington, DC |c 2019 |b American Chemical Society |
| 336 | 7 | _ | |a article |2 DRIVER |
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| 500 | _ | _ | |a © American Chemical Society |
| 520 | _ | _ | |a Robust and scalable thin film deposition methods are key to realize the potential of metal-organic frameworks (MOFs) in electronic devices. Here, we report the first integration of the chemical vapor deposition (CVD) of MOF coatings in a custom reactor within a cleanroom setting. As a test case, the MOF-CVD conditions for ZIF-8 are optimized to enable smooth, pinhole-free, and uniform thin films on full 200 mm wafers under mild conditions. The single-chamber MOF-CVD process and the impact of the deposition parameters are elucidated via a combination of in situ monitoring and ex situ characterization. The resulting process guidelines will pave the way for new MOF-CVD formulations and a plethora of MOF-based devices. |
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| 773 | _ | _ | |a 10.1021/acs.chemmater.9b03435 |g p. acs.chemmater.9b03435 |0 PERI:(DE-600)1500399-1 |n 22 |p 9462 - 9471 |t Chemistry of materials |v 31 |y 2019 |x 1520-5002 |
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