Home > Publications database > Structure-Related Electronic and Magnetic Properties in Ultrathin Epitaxial NixFe$_{3−x}$O$_4$ Films on MgO(001) |
Journal Article | PUBDB-2025-00286 |
; ; ; ; ; ; ;
2024
MDPI
Basel
This record in other databases:
Please use a persistent id in citations: doi:10.3390/nano14080694 doi:10.3204/PUBDB-2025-00286
Abstract: Off-stoichiometric NixFe$_{3−x}$O$_4$ ultrathin films (x < 2.1) with varying Ni content x and thickness 16 (±2) nm were grown on MgO(001) by reactive molecular beam epitaxy. Synchrotron-based high-resolution X-ray diffraction measurements reveal vertical compressive strain for all films, resulting from a lateral pseudomorphic adaption of the film to the substrate lattice without any strain relaxation. Complete crystallinity with smooth interfaces and surfaces is obtained independent of the Ni content x. For x < 1 an expected successive conversion from Fe$_3$O$_4$ to NiFe$_2$O$_4$ is observed, whereas local transformation into NiO structures is observed for films with Ni content x > 1. However, angle-resolved hard X-ray photoelectron spectroscopy measurements indicate homogeneous cationic distributions without strictly separated phases independent of the Ni content, while X-ray absorption spectroscopy shows that also for x > 1, not all Fe$^{2+}$ cations are substituted by Ni$^{2+}$ cations. The ferrimagnetic behavior, as observed by superconducting quantum interference device magnetometry, is characterized by decreasing saturation magnetization due to the formation of antiferromagnetic NiO parts.
![]() |
The record appears in these collections: |