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000622248 245__ $$aStructure-Related Electronic and Magnetic Properties in Ultrathin Epitaxial NixFe$_{3−x}$O$_4$ Films on MgO(001)
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000622248 500__ $$aThis research was funded by Deutsche Forschungsgemeinschaft (DFG) grant Nos. KU2321/6-1and WO533/20-1.
000622248 520__ $$aOff-stoichiometric NixFe$_{3−x}$O$_4$ ultrathin films (x < 2.1) with varying Ni content x and thickness 16 (±2) nm were grown on MgO(001) by reactive molecular beam epitaxy. Synchrotron-based high-resolution X-ray diffraction measurements reveal vertical compressive strain for all films, resulting from a lateral pseudomorphic adaption of the film to the substrate lattice without any strain relaxation. Complete crystallinity with smooth interfaces and surfaces is obtained independent of the Ni content x. For x < 1 an expected successive conversion from Fe$_3$O$_4$ to NiFe$_2$O$_4$ is observed, whereas local transformation into NiO structures is observed for films with Ni content x > 1. However, angle-resolved hard X-ray photoelectron spectroscopy measurements indicate homogeneous cationic distributions without strictly separated phases independent of the Ni content, while X-ray absorption spectroscopy shows that also for x > 1, not all Fe$^{2+}$ cations are substituted by Ni$^{2+}$ cations. The ferrimagnetic behavior, as observed by superconducting quantum interference device magnetometry, is characterized by decreasing saturation magnetization due to the formation of antiferromagnetic NiO parts. 
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000622248 7001_ $$0P:(DE-H253)PIP1032007$$aThien, Jannis$$b1
000622248 7001_ $$0P:(DE-H253)PIP1031954$$aRuwisch, Kevin$$b2
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000622248 7001_ $$0P:(DE-H253)PIP1007860$$aWollschläger, Joachim$$b7$$eCorresponding author
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