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| Home > Publications database > Short-range order and atomic diffusion in liquid Ge and $Si_{20}Ge_{80}$ investigated by neutron scattering and x-ray diffraction |
| Home > Publications database > Short-range order and atomic diffusion in liquid Ge and $Si_{20}Ge_{80}$ investigated by neutron scattering and x-ray diffraction |
| Journal Article | PUBDB-2022-00375 |
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2021
Inst.
Woodbury, NY
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Please use a persistent id in citations: doi:10.1103/PhysRevB.104.134108 doi:10.3204/PUBDB-2022-00375
Abstract: We studied structure and dynamics in liquid Ge and Si$_{20}$Ge$_{80}$. Quasielastic neutron scattering (QNS) was employed to accurately determine the Ge self-diffusion coefficient. Static structure factors were measured using neutron and x-ray diffraction. Containerless processing via electromagnetic levitation (EML) enabled to obtain structure factors over a broad temperature range from the metastable regime of the undercooled melt to several hundred Kelvin above the melting point. Moreover, isotopic substitution and combination with x-ray diffraction allowed to determine the partial structure factors SNN(q), SNC(q), SGeGe(q), and SGeSi(q) for liquid $_{20}$Ge$_{80}$. The topological structures of liquid Ge and Si$_{20}$Ge$_{80}$ are very similar. In addition, the Ge self-diffusion coefficients in liquid Ge and Si$_{20}$Ge$_{80}$ are equal within error limits.
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