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000473957 1001_ $$0P:(DE-H253)PIP1024292$$aWeis, H.$$b0
000473957 245__ $$aShort-range order and atomic diffusion in liquid Ge and $Si_{20}Ge_{80}$ investigated by neutron scattering and x-ray diffraction
000473957 260__ $$aWoodbury, NY$$bInst.$$c2021
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000473957 520__ $$aWe studied structure and dynamics in liquid Ge and Si$_{20}$Ge$_{80}$. Quasielastic neutron scattering (QNS) was employed to accurately determine the Ge self-diffusion coefficient. Static structure factors were measured using neutron and x-ray diffraction. Containerless processing via electromagnetic levitation (EML) enabled to obtain structure factors over a broad temperature range from the metastable regime of the undercooled melt to several hundred Kelvin above the melting point. Moreover, isotopic substitution and combination with x-ray diffraction allowed to determine the partial structure factors SNN(q), SNC(q), SGeGe(q), and SGeSi(q) for liquid $_{20}$Ge$_{80}$. The topological structures of liquid Ge and Si$_{20}$Ge$_{80}$ are very similar. In addition, the Ge self-diffusion coefficients in liquid Ge and Si$_{20}$Ge$_{80}$ are equal within error limits.
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000473957 7001_ $$0P:(DE-H253)PIP1014142$$aHolland-Moritz, Dirk$$b1$$eCorresponding author
000473957 7001_ $$0P:(DE-H253)PIP1081840$$aKargl, F.$$b2
000473957 7001_ $$aYang, F.$$b3
000473957 7001_ $$0P:(DE-H253)PIP1011282$$aUnruh, T.$$b4
000473957 7001_ $$aHansen, T. C.$$b5
000473957 7001_ $$0P:(DE-H253)PIP1005870$$aBednarcik, Jozef$$b6
000473957 7001_ $$aMeyer, A.$$b7
000473957 773__ $$0PERI:(DE-600)2844160-6$$a10.1103/PhysRevB.104.134108$$gVol. 104, no. 13, p. 134108$$n13$$p134108$$tPhysical review / B$$v104$$x1098-0121$$y2021
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