Journal Article

PUBDB-2026-00834

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Wafer-scale high-κ HfO2 dielectric films with sub-5-Å equivalent oxide thickness for 2D MoS2 transistors

Zhang, S. ; Zhang, T. ; Yu, H. ; Li, T. ; Li, X. ; Cui, C. ; Zhou, Y. ; Guo, H. ; Wang, S. ; Zheng, D. ; Huang, L. ; Bai, L. ; Liu, S. ; Shen, C. ; Yang, W. ; Du, L. ; Shi, D. ; Xian, L.Extern*MPG* ; Tao, X. ; Chai, Y. ; Li, N. ; Zhang, G.

2026
Springer Nature [London]

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Please use a persistent id in citations: doi:10.1038/s41467-026-68584-0

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Appears in the scientific report 2026

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