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@ARTICLE{Zhang:646413,
      author       = {Zhang, Songge and Zhang, Tao and Yu, Hua and Li, Tong and
                      Li, Xiuzhen and Cui, Chenyang and Zhou, Yuchao and Guo,
                      Hailing and Wang, Shuopei and Zheng, Dongfeng and Huang,
                      Liangfeng and Bai, Liqi and Liu, Su and Shen, Cheng and
                      Yang, Wei and Du, Luojun and Shi, Dongxia and Xian, Lede and
                      Tao, Xiaoming and Chai, Yang and Li, Na and Zhang, Guangyu},
      title        = {{W}afer-scale high-κ {H}f{O}2 dielectric films with
                      sub-5-Å equivalent oxide thickness for 2{D} {M}o{S}2
                      transistors},
      journal      = {Nature Communications},
      volume       = {17},
      number       = {1},
      issn         = {2041-1723},
      address      = {[London]},
      publisher    = {Springer Nature},
      reportid     = {PUBDB-2026-00834},
      pages        = {1888},
      year         = {2026},
      ddc          = {500},
      experiment   = {EXP:(DE-MLZ)NOSPEC-20140101},
      typ          = {PUB:(DE-HGF)16},
      doi          = {10.1038/s41467-026-68584-0},
      url          = {https://bib-pubdb1.desy.de/record/646413},
}