Home > In process > Wafer-scale high-κ HfO2 dielectric films with sub-5-Å equivalent oxide thickness for 2D MoS2 transistors > print

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245 _ _ |a Wafer-scale high-κ HfO2 dielectric films with sub-5-Å equivalent oxide thickness for 2D MoS2 transistors
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700 1 _ |a Zhang, Tao
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700 1 _ |a Yu, Hua
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700 1 _ |a Li, Tong
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700 1 _ |a Li, Xiuzhen
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700 1 _ |a Cui, Chenyang
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700 1 _ |a Wang, Shuopei
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700 1 _ |a Du, Luojun
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700 1 _ |a Shi, Dongxia
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700 1 _ |a Tao, Xiaoming
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700 1 _ |a Chai, Yang
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700 1 _ |a Li, Na
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700 1 _ |a Zhang, Guangyu
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