Journal Article

PUBDB-2022-00170

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Surface characterization and resistance changes of silver-nanowire networks upon atmospheric plasma treatment

Akinsinde, L. O. (Corresponding author)CFEL*Extern* ; Glier, T. E. (Corresponding author)Extern* ; Schwartzkopf, M. (Corresponding author)DESY* ; Betker, M.DESY* ; Nissen, M. ; Witte, M. ; Scheitz, S.CFEL*Extern* ; Nweze, C.CFEL*Extern* ; Grimm-Lebsanft, B.Extern* ; Gensch, M.DESY* ; Chumakov, A.DESY* ; Baev, I.Extern*XFEL.EU* ; Schürmann, U. ; Dankwort, T. ; Fischer, F. ; Martins, M.Extern*XFEL.EU* ; Roth, S. V.XFEL.EU*DESY* ; Kienle, L.Extern* ; Ruebhausen, M. (Corresponding author)CFEL*

2021
Elsevier Amsterdam

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Please use a persistent id in citations: doi:10.1016/j.apsusc.2021.149362

Abstract: Highly conductive silver-nanowire (Ag-NW) networks are used in composite materials as conductive channels. Their resistance tuning can be accomplished by changing the Ag-NW concentration, and, therefore, changing the network structure. In this study, an alternative pathway to resistance engineering of conductive Ag-NW networks by local atmospheric plasma treatment is employed. The corresponding changes in nanowire network morphology and crystallinity as a function of plasma etching time are investigated by time-resolved grazing-incidence X-ray scattering, field-effect scanning electron microscopy, and X-ray photoelectron spectroscopy. Three characteristic etching phases are identified. The first two phases enable the controlled engineering of the electrical properties with different rates of resistance change, which results from changes in nanowire shape, network morphology, and different oxidation rates. Phase III is characterized by pronounced fragmentation and destruction of the Ag-NW networks. These results show the feasibility of atmospheric plasma treatments to tune the local electrical properties of conductive Ag-NW networks. Furthermore, we present a physical Monte Carlo model explaining the electrical network properties as a function of plasma etching time based on the network connectivity and a constant plasma etching rate of 570 ng s$^{−1}$ cm$^{−2}$.

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Contributing Institute(s):

1. DOOR-User (DOOR ; HAS-User)
2. PETRA-D (FS-PETRA-D)
3. UNI/INF (CFEL-AO)
4. Uni Hamburg / Experimentalphysik (UNI/EXP)

Research Program(s):

1. 632 - Materials – Quantum, Complex and Functional Materials (POF4-632) (POF4-632)
2. 6G3 - PETRA III (DESY) (POF4-6G3) (POF4-6G3)

Experiment(s):

1. PETRA Beamline P03 (PETRA III)

Appears in the scientific report 2021

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Database coverage:
; Clarivate Analytics Master Journal List ; Current Contents - Engineering, Computing and Technology ; Current Contents - Physical, Chemical and Earth Sciences ; Ebsco Academic Search ; Essential Science Indicators ; IF >= 5 ; JCR ; Nationallizenz ; SCOPUS ; Science Citation Index Expanded ; Web of Science Core Collection

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