Review/Contribution to a book

PUBDB-2014-03435

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png The Influence of Multilayer Design on Residual Stress Gradients in Ti/TiAlN Systems

Selvadurai, U. (Corresponding Author)Extern* ; Tillmann, W.Extern* ; Fischer, G.Extern* ; Sprute, T.Extern*

2013
Trans Tech Publ. Uetikon

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Please use a persistent id in citations: doi:10.4028/www.scientific.net/MSF.768-769.264

Abstract: In this research work, Ti/TiAlN multilayers of various designs were deposited onsubstrates pretreated by nitriding and etching procedures. The influence of the multilayer design onresidual stress depth profiles was systematically analyzed for multilayers with different Titaniuminterlayer thicknesses. The depth-dependency of stress was measured by a modified sin2ψ method,using various defined gracing incident angles and measuring angles that ensure constant penetrationdepths. The residual stresses were investigated by synchrotron X-ray diffraction (SXRD) at theHASYLAB at DESY in Hamburg, Germany. SXRD allows a phase specific stress evaluation of theceramic and metallic layers of the multilayer systems and the adjacent substrate region.This investigation reveals an influence of the Ti layer thickness on the values and the slope of theresidual stress profile in ceramic TiAlN layers.

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Contributing Institute(s):

1. DOOR-User (DOOR)

Research Program(s):

1. DORIS Beamline G3 (POF2-54G13) (POF2-54G13)

Experiment(s):

1. DORIS Beamline G3 (DORIS III)

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Database coverage:
JCR ; Nationallizenz ; SCOPUS ; Thomson Reuters Master Journal List ; Web of Science Core Collection

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