Journal Article

DESY-2014-02099

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Rapid thermal annealing of FePt thin films

Albrecht, M. (Corresponding author)Extern* ; Brombacher, C.Extern*

2013
Wiley-VCH Weinheim

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Please use a persistent id in citations: doi:10.1002/pssa.201228718

Abstract: In this study, Fe52Pt48 thin films were DC magnetron sputter-deposited at room temperature onto thermally oxidized silicon wafers. Rapid thermal annealing (RTA) was employed to induce the phase transformation from the chemically disordered A1 phase into the chemically ordered L10 phase. The influence of the annealing temperature, annealing time, and the film thickness on the ordering transformation and (001) texture evolution of FePt films was studied. Rapid thermal annealed films processed at temperatures larger than 600 °C exhibit high chemical L10 order with strong (001) texture. The resultant high perpendicular magnetic anisotropy and large coercivities up to 40 kOe are demonstrated. Simultaneously to the ordering transformation, RTA leads to a strong dewetting behavior of the film forming large islands.

Note: © WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim; Post referee fulltext in progress; Embargo 12 months from publication

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Contributing Institute(s):

1. DOOR-User (DOOR)

Research Program(s):

1. DORIS Beamline G3 (POF2-54G13) (POF2-54G13)

Experiment(s):

1. DORIS Beamline G3 (DORIS III)

Appears in the scientific report 2013

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Database coverage:
; JCR ; Nationallizenz ; SCOPUS ; Science Citation Index ; Science Citation Index Expanded ; Thomson Reuters Master Journal List ; Web of Science Core Collection ; Zoological Record

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