Journal of vacuum science & technology / B: JVST ; the official journal of the American Vacuum Society: Microelectronics processing and phenomena
	Common abbreviations: JVTBD9 [DE-600] J. Vac. Sci. Technol. B [DE-600] J Vac Sci Technol B Microelectron Nanometer Struct Process Meas Phenom [iso] J Vac Sci Technol B Microelectron Nanometer Struct Process Meas Phenom [dnlm] J Vac Sci Technol B Microelectron Nanometer Struct Process Meas Phenom [iso] J Vac Sci Technol B Nanotechnol Microelectron [dnlm] J Vac Sci Technol B Nanotechnol Microelectron [iso]

Type:	journal
DDC:	530
Keywords(s):	Halbleitertechnologie, Zeitschrift, Online-Ressource, Dünnschichttechnik, Zeitschrift, Online-Ressource, Vakuumphysik, Zeitschrift, Online-Ressource, General Engineering, Materials Chemistry, Electrical and Electronic Engineering, Surfaces, Coatings and Films, Process Chemistry and Technology, Instrumentation, Electronic, Optical and Magnetic Materials
ISSN(s):	0734-211X, 2166-2746, 2166-2754, 2327-9877
Publisher:	Inst. : New York, NY 1983-1990
Country:	United States of America
Appears:	online, print, data medium
ID:	PERI:(DE-600)1475429-0

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Database coverage:
; Clarivate Analytics Master Journal List ; Current Contents - Electronics and Telecommunications Collection ; Current Contents - Engineering, Computing and Technology ; Current Contents - Physical, Chemical and Earth Sciences ; Essential Science Indicators ; IF < 5 ; JCR ; National-Konsortium ; PubMed Central ; SCOPUS ; Science Citation Index Expanded ; Web of Science Core Collection

Recent Publications

All known publications ...
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http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Casandruc, A. (Corresponding author)CFEL*MPG* ; Kassier, G.CFEL*MPG* ; Zia, H.Extern* ; Bücker, R.CFEL*MPG* ; Miller, R. J. D.Extern*
Fiber Tip-Based Electron Source
Journal of vacuum science & technology / B 33(3), 03C101 - (2015) [10.1116/1.4902016]2015     Files BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Lee, C. (Corresponding author)CFEL*MPG* ; Kanungo, P. D. ; Guzenko, V. ; Hefenstein, P. ; Miller, R. J. D.Extern* ; Tsujino, S. (Corresponding author)
Field Emission Beam Characteristics of Single Metal Nanotip Cathodes with On-Chip Collimation Gate Electrode
Journal of vacuum science & technology / B 33(3), 03C111 - (2015) [10.1116/1.4913397]2015     Files BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Flege, J. I. (Corresponding Author)Extern* ; Kaemena, B. ; Schmidt, T.Extern* ; Falta, J.Extern*
Epitaxial, well-ordered ceria/lanthana high-k gate dielectrics on silicon
Journal of vacuum science & technology / B 32(3), 03D124 (2014) [10.1116/1.4876122]2014     Files BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Walczyk, C. ; Wenger, C. ; Walczyk, D. ; Lukosius, M. ; Costina, I. ; Fraschke, M. ; Dabrowski, J. ; Fox, A. ; Wolansky, D. ; Thiess, S. ; Miranda, E. ; Tillack, B. ; Schröder, T. ; DESY
On the role of Ti adlayers for resistive switching in HfO2-based metal-insulator-metal structures: Top versus bottom electrode integration
Journal of vacuum science & technology / B 29, 01AD02 - 01AD02-7 (2011) [10.1116/1.3536524]2011   BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Hrauda, N. (Corresponding author)Extern* ; Zhang, J. J. ; Stangl, J. ; Rehman-Khan, A. ; Bauer, G. ; Stoffel, M. ; Schmidt, O. G. ; Jovanovich, V. ; Nanver, L. K. ; DESY
X-ray investigation of buried SiGe islands for devices with strain-enhanced mobility
2009International Conference on Nanoscience and Technology, ICN+T 2008, KeystoneKeystone, Colorado /USA, 20 Jul 2008 - 25 Jul 20082008-07-202008-07-25 Journal of vacuum science & technology / B 27, 912-918 (2009) [10.1116/1.3056178]2009     Files BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Kurapova, O. ; Lengeler, B. ; Schroer, C. G.DESY* ; Küchler, M. ; Gessner, T. ; van der Hart, A.
Optimized fabrication of silicon nanofocusing x-ray lenses using deep reactive ion etching
Journal of vacuum science & technology / B 25(5), 1626 - (2007) [10.1116/1.2769361]2007   BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Županc-Mežnar, L. (Corresponding author) ; Cerc-Korošec, R. ; Bukovec, P. ; Padežnik Gomilšek, J.
$\mathrm{Eu^{3+}}$-activated silica prepared by the alkoxide sol–gel method
Journal of vacuum science & technology / B 18(2), 1097 - 1100 (2000) [10.1116/1.591337]2000     Files BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Rubini, S. ; Bonanni, B. ; Pelucchi, E. ; Franciosi, A. (Corresponding author) ; Garulli, A. ; Parisini, A. ; Zhuang, Y. ; Bauer, G. ; Holý, V.
ZnSe/CdTe/ZnSe heterostructures
Journal of vacuum science & technology / B 18(4), 2263 - (2000) [10.1116/1.1305921]2000     Files BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Journal Article Berbezier, I. (Corresponding author)
New insights on SiGe growth instabilities
Journal of vacuum science & technology / B 16(3), 1582 (1998) [10.1116/1.589943]1998   BibTeX | EndNote: XML, Text | RIS

All known publications ...
Download: BibTeX | EndNote XML,  Text | RIS |