| Home > Documents in process > Comprehensive Study of Structural and Electrocatalytic Properties of Ni–N Thin Films |
| Journal Article | PUBDB-2026-00281 |
; ; ; ;
2025
Wiley-VCH
Weinheim
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Please use a persistent id in citations: doi:10.1002/pssr.202500327
Abstract: This work presents a systematic and detailed investigation of the structural, electronic, and electrochemical properties of Ni–N thin films grown using a reactive magnetron sputtering at partial nitrogen flow (RN2) of 0, 15, 50, 75, and 100%. Below RN2 = 50%, the phase formed is metallic Ni with some N atoms occupying interstitial sites. However, when the RN2 exceeds 50%, the Ni3N phase sets in, and a fully stoichiometric Ni3N phase is realized at RN2 = 100%. As RN2 increases, the oxidation state of Ni increases and the structural ordering improves, as substantiated by X-ray absorption fine structure and X-ray diffraction analysis. Additionally, hard X-ray photoelectron spectroscopy measurements confirm the formation of a fully stoichiometric Ni3N phase at RN2 = 100%. Finally, the electrocatalytic performance measured through the oxygen evolution reaction clearly demonstrates better performance of Ni3N as compared to pure Ni or other Ni–N phases. This work provides essential building blocks to establish Ni3N as an environmentally friendly, noble metal-free, and earth-abundant catalyst for water splitting reactions.
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