Journal Article

PUBDB-2019-04833

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Soft X-ray microscopy and lithography with synchrotron radiation

Gudat, W.DESY*

1978
Elsevier Amsterdam

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Please use a persistent id in citations: doi:10.1016/0029-554X(78)90280-X

Abstract: Considerable progress in microscopy techniques with soft X-ray radiation has been achieved in particular through the application of synchrotron radiation. Various methods which are currently being studied theoretically or already being used practically will be described briefly. Attention is focused on the method of contact microscopy. Various biological specimens have been investigated by this method with a resolution as good as 100 Å. X-ray lithography which in the technical procedure is very similar to contact microscopy gives promise for the fabrication of high quality submicron structure in electronic device production. Important factors limiting the resolution and determining the performance of contact microscopy and X-ray lithography will be discussed.

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Contributing Institute(s):

1. Bibliothek und Dokumentation (L)

Research Program(s):

1. 899 - ohne Topic (POF3-899) (POF3-899)

Experiment(s):

1. No specific instrument

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