%0 Conference Paper
%A Zakharova, Margarita
%A Wong, Jia Chyi
%A Prasciolu, Mauro
%A Dresselhaus, Jan Lukas
%A Fleckenstein, Holger
%A Chapman, Henry N.
%A Bajt, Sasa
%T Multilayer Laue Lenses for focusing XFEL beams
%J Proceedings of SPIE
%V 13533
%@ 0038-7355
%C Bellingham, Wash.
%I SPIE
%M PUBDB-2025-01109
%P 1353309
%D 2025
%< Optics Damage and Materials Processing by EUV/X-ray Radiation (XDam9) : [Proceedings] - SPIE, 2025. - ISBN 97815106886299781510688636 - doi:10.1117/12.3057178
%X X-ray optical elements in X-ray Free Electron Laser (XFEL) applications experience high thermal loads. Whilereflective optics can spread the incident beam over a larger area to reduce heating, refractive and diffractiveoptics must mitigate this by minimizing X-ray absorption, which necessitates the use of low atomic numbermaterials. To address this challenge, we evaluated various multilayer material pairs and identified Mo2C/SiCas the optimal choice due to its superior diffraction efficiency and thermal stability. Here, we present the novelwedged multilayer Laue lenses (MLLs) which were successfully used to focus XFEL beams at the European XFEL.A lens pair fabricated from the same Mo2C/SiC multilayer of 100 µm deposited thickness was characterized beforeand after XFEL experiment using a laboratory-based X-ray setup. The MLLs maintained stable performancethroughout a week-long XFEL beamtime, with no observed degradation in focusing performance or structuralintegrity. These results demonstrate the robustness and suitability of MLLs for high-intensity X-ray applications.
%B SPIE Optics + Optoelectronics
%C 7 Apr 2025 - 11 Apr 2025, Prague (Czech Republic)
Y2 7 Apr 2025 - 11 Apr 2025
M2 Prague, Czech Republic
%F PUB:(DE-HGF)16 ; PUB:(DE-HGF)8 ; PUB:(DE-HGF)7
%9 Journal ArticleContribution to a conference proceedingsContribution to a book
%R 10.1117/12.3057178
%U https://bib-pubdb1.desy.de/record/625335