TY  - JOUR
AU  - Dresselhaus, Jan Lukas
AU  - Zakharova, Margarita
AU  - Ivanov, Nikolay
AU  - Fleckenstein, Holger
AU  - Prasciolu, Mauro
AU  - Yefanov, Oleksandr
AU  - Li, Chufeng
AU  - Zhang, Wenhui
AU  - Middendorf, Philipp
AU  - Egorov, Dmitry
AU  - De Gennaro Aquino, Ivan
AU  - Chapman, Henry N.
AU  - Bajt, Sasa
TI  - X-ray focusing below 3 nm with aberration-corrected multilayer Laue lenses
JO  - Optics express
VL  - 32
IS  - 9
SN  - 1094-4087
CY  - Washington, DC
PB  - Optica
M1  - PUBDB-2024-00176
SP  - 16004
PY  - 2024
AB  - Multilayer Laue lenses are volume diffractive optical elements for hard X-rays with the potential to focus beams to sizes as small as 1 nm. This ability is limited by the precision of the manufacturing process, whereby systematic errors that arise during fabrication contribute to wavefront aberrations even after calibration of the deposition process based on wavefront metrology. Such aberrations can be compensated by using a phase plate. However, current high numerical aperture (NA) lenses for nanometer resolution exhibit errors that exceed those that can be corrected by a single phase plate. To address this, we accumulate a large wavefront correction by propagation through a linear array of 3D-printed phase correcting elements. With such a compound refractive corrector (CRC), we report on a point spread function with a full-width at half maximum area of 2.8 × 2.9 nm2 at a photon energy of 17.5 keV.
LB  - PUB:(DE-HGF)16
C6  - 38859238
UR  - <Go to ISI:>//WOS:001234149100004
DO  - DOI:10.1364/OE.518964
UR  - https://bib-pubdb1.desy.de/record/601422
ER  -