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@ARTICLE{Wilkens:309425,
author = {Wilkens, H. and Spieß, W. and Zoellner, M. H. and Niu, G.
and Schroeder, T. and Wollschlaeger, Joachim},
title = {{P}ost deposition annealing of epitaxial
$\mathrm{{C}e_{1−x}{P}r_{x}{O}_{2-\delta}}$ films grown on
{S}i(111)},
journal = {Physical chemistry, chemical physics},
volume = {17},
number = {15},
issn = {1463-9084},
address = {Cambridge},
publisher = {RSC Publ.},
reportid = {PUBDB-2016-03811},
pages = {9991 - 9996},
year = {2015},
abstract = {n this work the structural and morphological changes of
Ce$_{1−x}$Pr$_{x}$O$_{2-\delta}$ (x= 0.20, 0.35 and 0.75)
films grown on Si(111) due to post deposition annealing are
investigated by low energy electron diffraction combined
with a spot profile analysis. The surface of the oxide films
exhibit mosaics with large terraces separated by monoatomic
steps. It is shown that the Ce/Pr ratio and post deposition
annealingtemperature can be used to tune the mosaic spread,
terrace size and step height of the grains. The
morphological changes are accompanied by a phase transition
from a fluorite type lattice to a bixbyite structure.
Furthermore, at high PDA temperatures a silicate
formationvia a polycrystalline intermediate state is
observed.},
cin = {DOOR},
ddc = {540},
cid = {I:(DE-H253)HAS-User-20120731},
pnm = {899 - ohne Topic (POF3-899)},
pid = {G:(DE-HGF)POF3-899},
experiment = {EXP:(DE-H253)D-W1-20150101},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000352270700044},
pubmed = {pmid:25786189},
doi = {10.1039/C5CP01105A},
url = {https://bib-pubdb1.desy.de/record/309425},
}