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@ARTICLE{Flege:192586,
      author       = {Flege, Jan Ingo and Kaemena, Björn and Höcker, Jan and
                      Bertram, Florian and Wollschläger, Joachim and Schmidt,
                      Thomas and Falta, Jens},
      title        = {{U}ltrathin, epitaxial cerium dioxide on silicon},
      journal      = {Applied physics letters},
      volume       = {104},
      number       = {13},
      issn         = {1077-3118},
      address      = {Melville, NY},
      publisher    = {American Inst. of Physics},
      reportid     = {PUBDB-2014-04168},
      pages        = {131604},
      year         = {2014},
      abstract     = {It is shown that ultrathin, highly ordered, continuous
                      films of cerium dioxide may be prepared on silicon following
                      substrate prepassivation using an atomic layer of chlorine.
                      The as-deposited, few-nanometer-thin Ce2O3 film may very
                      effectively be converted at room temperature to almost fully
                      oxidized CeO2 by simple exposure to air, as demonstrated by
                      hard X-ray photoemission spectroscopy and X-ray diffraction.
                      This post-oxidation process essentially results in a
                      negligible loss in film crystallinity and interface
                      abruptness.},
      cin          = {DOOR},
      ddc          = {530},
      cid          = {I:(DE-H253)HAS-User-20120731},
      pnm          = {DORIS Beamline BW1 (POF2-54G13) / DORIS Beamline BW2
                      (POF2-54G13)},
      pid          = {G:(DE-H253)POF2-BW1-20130405 /
                      G:(DE-H253)POF2-BW2-20130405},
      experiment   = {EXP:(DE-H253)D-BW1-20150101 / EXP:(DE-H253)D-BW2-20150101},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000334408500016},
      doi          = {10.1063/1.4870585},
      url          = {https://bib-pubdb1.desy.de/record/192586},
}