%0 Thesis
%A Dresselhaus, Jan Lukas
%T Characterization and correction of multilayer X-ray optics
%I University of Hamburg
%V Dissertation
%M PUBDB-2026-00727
%P 160
%D 2025
%Z Dissertation, University of Hamburg, 2025
%X Highest resolution X-ray microscopy requires high numerical aperture (NA) optics ofexcellent quality which allow to focus X-ray beams to small focal points. MultilayerLaue lenses (MLLs) are a new type of diffractive optic with the capability to focushard X-rays with high efficiency to nanometer spots. However, they are currentlylimited by wavefront aberrations caused by layer misplacements during their fab-rication process. The determination and correction of wavefront aberration aretherefore crucial aspects for the development and improvement of MLLs designedto achieve the highest possible resolutions. Wavefront characterization for lensdevelopment cannot rely solely on access to synchrotrons, as beamtime must beapplied for and is therefore only available to a limited extent. For that reason, theaim of this thesis was to determine the requirements that have to be met in orderto enable fast and precise wavefront characterization of MLLs using a laboratory-based setup. This requires a dedicated table top X-ray system and a suitable software.To determine the optimal structure for MLLs, periodic multilayer gratings withdifferent layer thicknesses on the scale of a few nanometers were studied. It wasfound that high quality and high efficiency (> 60 
%F PUB:(DE-HGF)11
%9 Dissertation / PhD Thesis
%R 10.3204/PUBDB-2026-00727
%U https://bib-pubdb1.desy.de/record/646127