%0 Journal Article
%A Lamba, Tarundeep Kaur
%A Vashistha, Tejasva
%A Singh, Sharanjeet
%A Sooraj, K. P.
%A Augustine, Sebin
%A Ranganathan, Raghavan
%A Vayalil, Sarathlal Koyiloth
%A Kumar, Dileep
%A Ranjan, Mukesh
%T Sequential growth of Ag nanoparticles on ripple-patterned Si: Insights from GISAXS/GIWAXS and MD simulations
%J Physica / B
%V 722
%@ 0921-4526
%C Amsterdam
%I Elsevier
%M PUBDB-2026-00466
%P 418066 
%D 2026
%Z Waiting for fulltext 
%X The spatial arrangement and morphology of metallic NPs critically influence performance in plasmonic and spintronic applications. Substrate topography, especially ion-irradiation induced ripple patterns, strongly affects NP nucleation, growth dynamics, and final geometry. For Ag-NPs on nanoripple silicon, assembly depends on deposition direction because the morphology is intrinsically asymmetric; GISAXS confirms one slope is steeper. Single-direction deposition promotes uniaxial, ellipsoidal Ag-NPs aligned in the ripple direction, whereas sequential deposition yields truncated NPs with more uniform spacing. GIWAXS indicates an FCC structure with preferred (111) and (200) orientations; d-spacings remain consistent at 0° and 90°, indicating structural stability. Molecular dynamics simulations support these findings, showing single-sided flux favors tilted, elongated growth, while sequential flux forms near-spherical NPs near ridge regions and distributes them across slopes. Together, experiment and simulation establish how coupling surface asymmetry with deposition geometry governs NP shape, ordering, and crystallinity, offering a substrate-guided route to engineering isotropic assemblies. 
%F PUB:(DE-HGF)16
%9 Journal Article
%R 10.1016/j.physb.2025.418066
%U https://bib-pubdb1.desy.de/record/644923