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000639766 041__ $$aEnglish
000639766 1001_ $$0P:(DE-H253)PIP1106144$$aZeeshan, Sumaira$$b0$$eCorresponding author
000639766 1112_ $$a13th MT ARD ST3 Meeting 2025 at DESY in Zeuthen, Zeuthen, Germany, 25 Jun 2025 - 27 Jun 2025$$cZeuthen$$d2025-06-25 - 2025-06-27$$wGermany
000639766 245__ $$aBeam Dynamics Optimization for a High-brightness Photo Injector with various Photocathode Laser Pulse Shapes
000639766 260__ $$c2025
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000639766 520__ $$aPITZ at DESY Zeuthen focuses on the development and optimization of high-brightness electron sources for the European XFEL. At PITZ, a thorough study of factors influencing emittance growth is carried out. Emittance growth due to space charge can be managed through precise laser pulse shaping techniques. 4D and 6D Integral brightness that incorporates not only the emittance, but electron beam current profile and longitudinal phase space properties from laser pulse shapes are proposed as objectives for the optimization. Multiobjectve optimization studies with ASTRA are aimed at not only minimizing emittance but maximizing brightness for various laser temporal profiles and widths. A comparative analysis for Gaussian, flattop and ellipsoidal and inverted parabolic Laser profiles is presented to compare their efficiency not only in terms of emittance but 4D and 6D brightness.
000639766 536__ $$0G:(DE-HGF)POF4-621$$a621 - Accelerator Research and Development (POF4-621)$$cPOF4-621$$fPOF IV$$x0
000639766 693__ $$0EXP:(DE-H253)PITZ-20150101$$5EXP:(DE-H253)PITZ-20150101$$ePhoto Injector Test Facility$$x0
000639766 7001_ $$0P:(DE-H253)PIP1004128$$aKrasilnikov, Mikhail$$b1
000639766 7001_ $$0P:(DE-H253)PIP1081485$$aLi, Xiangkun$$b2
000639766 7001_ $$0P:(DE-H253)PIP1022909$$aBazyl, Dmitry$$b3
000639766 7001_ $$0P:(DE-H253)PIP1004226$$aZagorodnov, Igor$$b4
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000639766 9101_ $$0I:(DE-588b)2008985-5$$6P:(DE-H253)PIP1106144$$aDeutsches Elektronen-Synchrotron$$b0$$kDESY
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000639766 9101_ $$0I:(DE-588b)2008985-5$$6P:(DE-H253)PIP1004226$$aDeutsches Elektronen-Synchrotron$$b4$$kDESY
000639766 9131_ $$0G:(DE-HGF)POF4-621$$1G:(DE-HGF)POF4-620$$2G:(DE-HGF)POF4-600$$3G:(DE-HGF)POF4$$4G:(DE-HGF)POF$$aDE-HGF$$bForschungsbereich Materie$$lMaterie und Technologie$$vAccelerator Research and Development$$x0
000639766 9141_ $$y2025
000639766 9201_ $$0I:(DE-H253)Z_PITZ-20210408$$kZ_PITZ$$lTechnologie$$x0
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