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@ARTICLE{Zakharova:627944,
      author       = {Zakharova, Margarita and Wong, Jia Chyi and Dresselhaus, J.
                      Lukas and Prasciolu, Mauro and Fleckenstein, Holger and Li,
                      Chufeng and De Gennaro Aquino, Ivan and Egorov, Dmitry and
                      Zhang, Wenhui and Morgan, Andrew J. and Ayyer, Kartik and
                      Sikorski, Marcin and Letrun, Romain and de Wijn, Raphael and
                      Kharitonov, Konstantin and Melo, Diogo and Round, Adam and
                      Bean, Richard J. and Chapman, Henry N. and Bajt, Saša},
      title        = {{F}ocusing of {X}-ray free-electron laser pulses using
                      multilayer {L}aue lenses},
      journal      = {Optics express},
      volume       = {33},
      number       = {15},
      issn         = {1094-4087},
      address      = {Washington, DC},
      publisher    = {Optica},
      reportid     = {PUBDB-2025-01692},
      pages        = {31884 - 31895},
      year         = {2025},
      abstract     = {Achieving the highest possible intensities of pulses at
                      X-ray free-electron
                      laser(XFEL)facilitiesentailsfocusingtheX-raybeamtothesmallestpossibledimensions.
                      MultilayerLauelensesarevolumediffractiveopticsthatholdpromisetoachievehighintensitiesduetotheirhighnumericalapertureathardX-raywavelengths.
                      Theselensesaremadebylayerdepositionandhence have a small
                      aperture that is usually less than 100µm. Consequently,
                      they must withstandhigh intensities and heat loads if used
                      to focus pulses of high energies. Here, we demonstrate
                      thefocusingofXFELpulsesusinglensesmadefromlayersofMo2CandSiC,whichwerechosenfortheirhighefficiencyandlowbeamheating.
                      WeshowthatlensalignmentandcharacterisationcanbecarriedoutusingattenuatedXFELpulsesusingthemethodofptychographicX-rayspeckletracking,
                      which also provides an approach for high-resolution
                      projection imaging with XFELpulses. The approach also gives
                      quantitative information about the distribution of
                      intensityin the focal plane, which is analysed here using
                      plots of the encircled energy describing
                      theproportionofthebeamenergyconcentratedintoacertaindiameter,showingthepossibilitytoreach
                      1.8×1020 Wcm−2 at a photon energy of 16.9keV. No
                      measurable change in the
                      wavefrontaberrationsofthelensescouldbedetectedaftertheiruseinanexperimentformanydayswithunattenuated
                      XFEL pulses, showing that the materials and mounting scheme
                      presented heremake theselenses suitablefor sustained use at
                      XFEL facilities.},
      cin          = {FS-ML / CFEL-I / XFEL-User},
      ddc          = {530},
      cid          = {I:(DE-H253)FS-ML-20120731 / I:(DE-H253)CFEL-I-20161114 /
                      I:(DE-H253)XFEL-User-20170713},
      pnm          = {632 - Materials – Quantum, Complex and Functional
                      Materials (POF4-632) / 6G3 - PETRA III (DESY) (POF4-6G3) /
                      FS-Proposal: I-20231166 (I-20231166)},
      pid          = {G:(DE-HGF)POF4-632 / G:(DE-HGF)POF4-6G3 /
                      G:(DE-H253)I-20231166},
      experiment   = {EXP:(DE-H253)P-P11-20150101 /
                      EXP:(DE-H253)XFEL-Exp-20150101},
      typ          = {PUB:(DE-HGF)16},
      doi          = {10.1364/OE.568357},
      url          = {https://bib-pubdb1.desy.de/record/627944},
}